Laser・Semiconductore manufacturing equipment・Metal additive manufacturing|Laser processing system|Laser micro machining machines

Laser micro machining system ABLASER

The handling companies : Nidec Machine Tool Corporation

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The original laser head technologies are for high precision and high efficiency.

ABLASER

Features

The optical laser head on the original technologies enables high precision helical machining.

The laser head adopts a prism rotator that adjusts and rotates the laser beam to an arbitrary hole diameter, enabling shape processing with sharp edges. It is also possible to drill holes of any cross-sectional shape, such as straight, tapered, reverse tapered or hand-drum-shaped.

ABLASER illustration

Schematic diagram of helical processing

  • Normal non-helical processing
    Normal non-helical processing
  • Our helical milling processing
    Our helical milling processing

Cutting test results for silicon material

  • Straight hole
    Straight hole
  • Reverse taper hole
    Reverse taper hole
  • Hand-drum hole
    Hand-drum hole

Processing example

Silicon surface straight microhole drilling

Silicon surface straight microhole drilling
MaterialSilicon wafer
Hole diameter0.15 mm
Plate thickness0.5 mm
Processing time9.0 sec/hole

SiC surface straight microhole drilling

SiC surface straight microhole drilling
MaterialSiC
Hole diameter0.08 mm
Plate thickness1.0 mm
Processing time15.0 sec/hole

Machinable ceramic surface straight microhole drilling

Machinable ceramic surface straight microhole drilling
MaterialMachinable ceramic
Hole diameter0.06 mm
Plate thickness0.6 mm
Processing time5.0 sec/hole

Helical milling hole drilling

Helical milling hole drilling
MaterialPlatinum
Hole diameter⌀2.0 mm
Plate thickness1.5 mm
Processing time4.0 sec/hole

Lithium tantalate (LiTaO3)

Lithium tantalate (LiTaO3)
Hole diameter0.02 mm
Pitch0.07 mm
Plate thickness0.25 mm
Aspect ratio12.5

It is possible to drill ⌀0.02 mm holes in lithium tantalate,
which is used in semiconductor products.

Lithium tantalate & silicon wafer

Lithium tantalate & silicon wafer
Hole diameter0.015 mm
Pitch0.1 mm
Plate thickness0.2 mm
Aspect ratio13.3

Even for multi-layered materials such as lithium tantalate and silicon, which are used in semiconductor products, holes of ⌀0.015 mm can be drilled using simultaneous processing.

Stainless steel Small diameter hole drilling

Stainless steel Small diameter hole drilling
Hole diameter0.027 mm
Plate thickness0.30 mm
Aspect ratio11.1

With the green laser ABLASER, it is possible to drill holes with a minimum diameter of ⌀27 μm.

Cemented carbide Square hole drilling

Cemented carbide Square hole drilling
Size0.20 mm
Plate thickness1.00 mm

Even with 1.0 mm thick cemented carbide, square holes with clean edges can be drilled.

Quartz glass Hole drilling

Quartz glass Hole drilling
Hole diameterφ0.185 mm
Pitch0.300 mm
Plate thickness0.2 mm
Aspect ratio1.08

It is possible to process quartz glass with good roundness without thermal effects.

Specifications

Item Specifications Remarks
X-axis (mm) 300 Precision scale equipped as standard
Y-axis (mm) 200 Precision scale equipped as standard
Z-axis (mm) 100 Precision scale equipped as standard
Positioning accuracy (mm) ±0.002
Maximum feed rate (m/min) 10
NC device FANUC 31iB
Maximum output 30W
Wavelength (nm) 515
Laser head Own products
Workpiece diameter (mm) ⌀0.05 to 0.3 It may vary depending on the material.
Taper hole control Forward taper/reverse taper/hand-drum shaped
Assist gas Selectable for each workpiece
Width × depth × height 2,040 × 2,590 × 2,220 Machine body only.
Excludes control enclosure and attachments.
Weight 5.0 t Machine body only.
Excludes control enclosure and attachments.
Fume collector Attachments
Internal air conditioning
X/Y/Z axis bellows Heat resistant specifications
Option Centering function
Supports sorters
Supports clean rooms
Other requests are available.

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